TRIARYLSULFONIUM HEXAFLUOROPHOSPHATE SALTS are widely used as photoacid generators (PAGs) in the photoresist industry, particularly in the production of semiconductors and microelectronics. When exposed to ultraviolet (UV) light, these compounds release strong acids, which catalyze chemical reactions in photoresist materials, enabling precise patterning on silicon wafers. Their high sensitivity and efficiency make them essential for advanced lithography processes, including deep UV and extreme UV (EUV) lithography, which are critical for manufacturing smaller and more complex integrated circuits. Additionally, these salts are utilized in coatings, adhesives, and printing plates where UV-induced curing or cross-linking is required. Their stability and effectiveness under light exposure contribute to their versatility in various high-tech applications.