This chemical is widely used as a photoacid generator (PAG) in photoresist formulations for the semiconductor and electronics industries. It plays a critical role in the photolithography process, where it generates acid upon exposure to ultraviolet (UV) light. The acid catalyzes chemical reactions that alter the solubility of the photoresist, enabling precise patterning of microelectronic components. Its high sensitivity and efficiency make it suitable for advanced manufacturing processes, including the production of integrated circuits and microchips. Additionally, it is valued for its thermal stability and compatibility with various resist materials, ensuring high-resolution imaging and performance in cutting-edge technologies.