This chemical is primarily utilized as a highly effective photoacid generator (PAG) in the field of photolithography, particularly in the manufacturing of semiconductors and microelectronics. When exposed to ultraviolet (UV) light, it releases strong acid, which is crucial for catalyzing the chemical reactions needed to create precise patterns on silicon wafers. Its stability and efficiency make it a valuable component in advanced photoresist formulations, enabling the production of smaller and more complex electronic devices. Additionally, it is employed in research and development for studying photoacid generation mechanisms and optimizing photoresist materials for next-generation technologies.