Used as a photoacid generator in advanced lithography processes, particularly in semiconductor manufacturing. When exposed to ultraviolet light, it releases acid which catalyzes chemical transformations in photoresist materials, enabling precise pattern development on silicon wafers. Its cyclopropane and phthalimide groups contribute to thermal stability and efficient acid generation, making it suitable for high-resolution patterning in microelectronics. Also explored in specialty polymers and as a crosslinking agent in light-sensitive coatings.