Used as a photoacid generator in advanced lithography processes, particularly in semiconductor manufacturing. When exposed to ultraviolet light, it releases a strong acid that catalyzes chemical transformations in photoresist materials, enabling precise patterning of microelectronic components. Also employed in polymer chemistry as a crosslinking agent or initiator for cationic polymerization due to its ability to generate acidic species upon thermal or photochemical activation. Its stability in the dark and rapid acid release upon exposure make it suitable for applications requiring high resolution and controlled reactivity.