Used as a photoacid generator in advanced photoresist formulations for semiconductor manufacturing. Upon exposure to deep ultraviolet (DUV) or extreme ultraviolet (EUV) light, it releases strong acid species that catalyze chemical transformations in resist materials, enabling high-resolution patterning of microelectronic circuits. Also employed in cationic polymerization processes where controlled initiation is required under light exposure. Its thermal stability and efficient photodecomposition make it suitable for precision applications in lithography and microfabrication.