Used as a photoacid generator in advanced photolithography processes, particularly in semiconductor manufacturing. Upon exposure to light, it releases acid which catalyzes chemical transformations in photoresist materials, enabling precise patterning of microelectronic components. Its adamantane core provides thermal stability and rigidity, while the dimethoxyphenyl groups enhance solubility and light sensitivity. This compound is especially valuable in deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography due to its ability to form high-resolution patterns with low outgassing, contributing to improved yield and performance in integrated circuit fabrication.