Used primarily as a photoacid generator in advanced lithography processes, especially in semiconductor manufacturing. Upon exposure to ultraviolet or deep ultraviolet light, it releases strong acids that catalyze chemical transformations in photoresist materials, enabling precise patterning of microelectronic components. Its high thermal stability and efficient acid generation make it suitable for high-resolution photolithography, including applications in fabricating integrated circuits and microprocessors. Also employed in specialty polymer curing and crosslinking where controlled acid initiation is required.