Used primarily as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. It generates acid upon exposure to UV light, which helps in the patterning process during lithography. The compound is valued for its high sensitivity and efficiency in producing fine patterns on silicon wafers. Additionally, it finds application in advanced materials research for developing high-resolution imaging systems. Its stability under processing conditions makes it suitable for use in deep UV and extreme UV lithography technologies.