Used as a precursor in chemical vapor deposition (CVD) processes to produce nickel-containing thin films for electronic devices. It serves as a nickel source in catalysis, particularly in reactions requiring soluble and stable nickel complexes. Its volatility and thermal stability make it suitable for depositing nickel oxide or metallic nickel layers in semiconductor manufacturing. Also applied in research for synthesizing nanomaterials and functional coatings due to controlled nickel release. The compound’s ligand structure enhances solubility and reactivity in organic and aqueous systems, broadening its use in material science and industrial chemistry.