Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to deposit molybdenum-containing thin films, such as molybdenum nitride (MoN) and molybdenum carbide (MoC) layers. These films are employed as diffusion barriers, gate electrodes, or interconnects in semiconductor manufacturing owing to their excellent thermal stability, low resistivity, and conformal deposition properties. The compound exhibits high volatility and clean thermal decomposition, ideal for precise nanoscale applications in microelectronics. Additionally, it is explored in catalytic applications, including olefin metathesis reactions and other high-oxidation-state molybdenum-mediated transformations in organic synthesis.