Nickel(II) trifluoroacetylacetonate dihydrate

98%

Reagent Code: #219987
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CAS Number 14324-83-5

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Storage Room temperature

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Used as a precursor in chemical vapor deposition (CVD) processes to produce nickel-containing thin films and coatings. These films are applied in electronics, catalysis, and magnetic materials due to their conductive and catalytic properties. Also serves as a catalyst or catalyst precursor in organic synthesis, especially in reactions requiring nickel in a well-defined coordination environment. Its volatility and thermal stability make it suitable for deposition techniques requiring controlled decomposition. Additionally, used in research for preparing functional nanomaterials and metal-organic frameworks (MOFs) where nickel centers are required.

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Size Availability Unit Price Quantity
inventory 100mg
10-20 days ฿2,130.00
inventory 250mg
10-20 days ฿3,250.00
inventory 1g
10-20 days ฿8,770.00
inventory 5g
10-20 days ฿28,630.00

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