Nickel(II) trifluoroacetylacetonate dihydrate
98%
Reagent
Code: #219987
CAS Number
14324-83-5
blur_circular Chemical Specifications
inventory_2
Storage & Handling
Storage
Room temperature
description Product Description
Used as a precursor in chemical vapor deposition (CVD) processes to produce nickel-containing thin films and coatings. These films are applied in electronics, catalysis, and magnetic materials due to their conductive and catalytic properties. Also serves as a catalyst or catalyst precursor in organic synthesis, especially in reactions requiring nickel in a well-defined coordination environment. Its volatility and thermal stability make it suitable for deposition techniques requiring controlled decomposition. Additionally, used in research for preparing functional nanomaterials and metal-organic frameworks (MOFs) where nickel centers are required.
shopping_cart Available Sizes & Pricing
Cart
No products
Subtotal:
0.00
Total
0.00
THB