Used as a precursor in vapor deposition processes to produce vanadium-containing thin films for semiconductor and electronic applications. Its high volatility and thermal stability make it suitable for atomic layer deposition (ALD) and chemical vapor deposition (CVD), where precise, uniform coatings are required. These films serve in advanced microelectronics, such as gate electrodes and diffusion barriers. Also investigated for catalytic applications in specialized organic transformations due to vanadium’s redox activity.