Widely used in advanced materials synthesis, this compound serves as a precursor in metal-organic chemical vapor deposition (MOCVD) processes to produce titanium dioxide (TiO₂) thin films. These films are essential in semiconductor devices, solar cells, and photocatalytic systems due to their excellent optical, electrical, and photocatalytic properties. The compound’s high volatility and thermal stability make it ideal for depositing uniform, high-purity coatings at relatively low temperatures. It is also employed in the preparation of nanostructured titanium oxides for sensors and energy storage applications, where precise control over composition and morphology is critical.