Used as a precursor in metal-organic chemical vapor deposition (MOCVD) for depositing germanium-containing thin films. These films are critical in semiconductor manufacturing, especially in advanced transistor technologies and optoelectronic devices. Its volatility and thermal decomposition properties make it suitable for integrating germanium into silicon-based platforms, enhancing electron mobility in high-performance chips. Also explored in the synthesis of germanium nanoparticles and nanostructures for research in next-generation electronics and photovoltaics.