Used primarily in research settings as a precursor for depositing germanium-containing thin films through chemical vapor deposition (CVD). Its ethyl groups enhance volatility, allowing for lower deposition temperatures compared to simpler germanium hydrides. These films are relevant in semiconductor manufacturing, especially in the development of advanced electronic and optoelectronic devices. Due to its sensitivity to air and moisture, handling requires inert atmosphere conditions, limiting its use to specialized applications. Not commonly used in industrial-scale processes due to stability and cost considerations.