Used in semiconductor manufacturing as a high-performance etching gas due to its thermal stability and ability to generate reactive fluorine species under plasma conditions. It serves as a precursor in chemical vapor deposition (CVD) processes for creating fluorinated diamond-like carbon coatings, which offer extreme hardness and chemical resistance. Also investigated for use in advanced lubricants for microelectromechanical systems (MEMS) where low surface energy and non-stick properties are critical. Its inert nature makes it suitable for specialty gas mixtures in analytical instruments requiring ultra-pure fluorocarbon components.