Used as a precursor in the synthesis of cobalt-containing materials, particularly in the production of thin films and coatings via chemical vapor deposition (CVD) or atomic layer deposition (ALD). It plays a key role in the fabrication of advanced electronic and magnetic devices due to its ability to deliver high-purity cobalt. Additionally, it is employed in research and development for creating catalysts in organic reactions, where cobalt acts as an active center. Its trifluoro groups enhance solubility and reactivity, making it suitable for specialized applications in material science and nanotechnology.