Hexamethyl disilylamine (HMDS) is widely used as a silylating agent in organic synthesis, particularly for protecting hydroxyl groups in alcohols and phenols. It is essential in the production of silicon-based polymers and resins, where it acts as a precursor or intermediate. In the semiconductor industry, HMDS is employed as an adhesion promoter in photolithography processes, enhancing the bonding of photoresist materials to silicon wafers. Additionally, it serves as a surface modifier in nanotechnology, improving the hydrophobicity of materials. Its role in gas-phase deposition processes also makes it valuable in the fabrication of thin films and coatings.