Hexafluoroacetylacetone is widely used in the electronics industry as a precursor for the deposition of thin films in semiconductor manufacturing. It plays a crucial role in chemical vapor deposition (CVD) processes, where it helps create high-quality, uniform layers of materials like metal oxides or fluorides on silicon wafers. Its volatility and reactivity make it ideal for producing precise and controlled coatings essential for advanced electronic devices.

In analytical chemistry, it is employed as a chelating agent for the extraction and separation of metal ions. Its strong affinity for transition metals allows for efficient complexation, making it useful in trace metal analysis and environmental monitoring. Additionally, it is utilized in nuclear fuel reprocessing to selectively extract actinides and lanthanides from spent fuel.

Hexafluoroacetylacetone is also used in organic synthesis as a building block for creating fluorinated compounds. Its unique structure enables the development of specialty chemicals with enhanced thermal and chemical stability, which are valuable in high-performance materials and coatings.