Used primarily as a precursor in chemical vapor deposition (CVD) processes to produce thin films of tungsten metal. These films serve in semiconductor manufacturing, particularly in microelectronics for creating conductive pathways and interconnects. It is also employed in the synthesis of tungsten-containing catalysts and organometallic complexes. Due to its volatility and thermal stability, it enables precise deposition at relatively low temperatures, making it suitable for advanced electronic device fabrication. Additionally, it finds use in research for developing new tungsten-based materials and nanostructures.