Tris(trifluoro-2,4-pentanedionato)aluminum(III)

>98.0%(T)

Reagent Code: #77847
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CAS Number 14354-59-7

science Other reagents with same CAS 14354-59-7

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 486.22 g/mol
Formula C₁₅H₁₂AlF₉O₆
badge Registry Numbers
MDL Number MFCD00042062
thermostat Physical Properties
Melting Point 121° C
inventory_2 Storage & Handling
Storage room temperature

description Product Description

This chemical is primarily used in the field of materials science, particularly in the deposition of thin films. It serves as a precursor in chemical vapor deposition (CVD) processes to create aluminum oxide coatings, which are essential for enhancing the durability and performance of various surfaces. Additionally, it is employed in the production of optoelectronic devices, where its properties help in achieving high-quality, uniform layers that are critical for the functionality of these devices. In the realm of nanotechnology, it plays a role in the synthesis of nanoparticles and nanostructures, contributing to advancements in electronics, photonics, and catalysis. Its application extends to the development of protective coatings for metals and glass, providing resistance to corrosion and wear.

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inventory 5g
10-20 days ฿11,376.00

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Tris(trifluoro-2,4-pentanedionato)aluminum(III)
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This chemical is primarily used in the field of materials science, particularly in the deposition of thin films. It serves as a precursor in chemical vapor deposition (CVD) processes to create aluminum oxide coatings, which are essential for enhancing the durability and performance of various surfaces. Additionally, it is employed in the production of optoelectronic devices, where its properties help in achieving high-quality, uniform layers that are critical for the functionality of these devices. In th

This chemical is primarily used in the field of materials science, particularly in the deposition of thin films. It serves as a precursor in chemical vapor deposition (CVD) processes to create aluminum oxide coatings, which are essential for enhancing the durability and performance of various surfaces. Additionally, it is employed in the production of optoelectronic devices, where its properties help in achieving high-quality, uniform layers that are critical for the functionality of these devices. In the realm of nanotechnology, it plays a role in the synthesis of nanoparticles and nanostructures, contributing to advancements in electronics, photonics, and catalysis. Its application extends to the development of protective coatings for metals and glass, providing resistance to corrosion and wear.

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