Tetrakis(dimethylamino)titanium(IV) is primarily used in the field of chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. It serves as a precursor for depositing titanium-containing thin films, which are essential in the semiconductor industry for manufacturing integrated circuits and other electronic components. The compound is particularly valued for its ability to form high-purity titanium nitride (TiN) films, which are used as diffusion barriers and conductive layers in microelectronic devices. Additionally, it is employed in the production of optical coatings and as a catalyst in various organic synthesis reactions, contributing to the development of advanced materials and chemical products.