Tetrakis(dimethylamino)titanium(IV)
≥97%
science Other reagents with same CAS 3275-24-9
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description Product Description
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for depositing ultra-thin titanium-containing films, such as titanium nitride (TiN) and titanium dioxide (TiO2). These films are essential in semiconductor manufacturing for diffusion barriers, high-k dielectrics, and gate electrodes in advanced microelectronics. It is also utilized in research and development for synthesizing novel titanium-based nanomaterials with applications in catalysis, energy storage, and nanotechnology.
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| Test Parameter | Specification |
|---|---|
| Appearance | Light yellow to brown clear liquid |
| Purity | 96.5-100 |
| Infrared Spectrum | Conforms to Structure |
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