Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)gallium(III)

98%

Reagent Code: #68360
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CAS Number 34228-15-4

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scatter_plot Molecular Information
Weight 619.54 g/mol
Formula C₃₃H₅₇GaO₆
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MDL Number MFCD00058705
inventory_2 Storage & Handling
Storage 2-8°C, protected from light, inert gas

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This chemical is primarily used in the field of materials science, particularly in the synthesis of advanced materials. It serves as a precursor for the deposition of gallium-containing thin films, which are essential in the production of semiconductors and optoelectronic devices. These thin films are crucial for applications such as light-emitting diodes (LEDs), solar cells, and transistors. Additionally, it is employed in chemical vapor deposition (CVD) processes to create high-purity gallium oxide layers, which are valued for their electrical insulation properties and thermal stability. Its role in nanotechnology is also notable, where it aids in the development of nanostructured materials with tailored electronic and optical properties.

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inventory 1g
10-20 days ฿7,722.00

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