Used primarily in the semiconductor industry, it serves as a precursor for depositing silicon nitride and silicon oxide thin films through chemical vapor deposition (CVD) processes. These films are critical for insulating layers and passivation in microelectronic devices. Additionally, it is employed in the production of advanced ceramics and coatings, enhancing their thermal and chemical resistance. Its role in surface modification also aids in improving adhesion and durability of materials in various industrial applications.