Tetrakis(dimethylamido)tin(IV)

99.9% trace metals basis

Reagent Code: #58507
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CAS Number 1066-77-9

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 295.01 g/mol
Formula C₈H₂₄N₄Sn
badge Registry Numbers
MDL Number MFCD00014860
thermostat Physical Properties
Boiling Point 53-55 °C at 1.013 hPa
inventory_2 Storage & Handling
Density 1.169 g/cm3
Storage room temperature, dry, inert gas

description Product Description

Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create thin films of tin-based materials, such as tin nitride or tin oxide, which are essential in semiconductor manufacturing and electronic devices. It is also employed in the synthesis of organotin compounds, which find applications in catalysts, stabilizers for PVC, and biocides. The compound’s high reactivity and volatility make it suitable for precise deposition in nanotechnology and advanced material research. Additionally, it plays a role in the development of transparent conductive coatings used in touchscreens and solar panels.

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Size Availability Unit Price Quantity
inventory 100mg
10-20 days ฿2,223.00

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