Tetrakis(dimethylamido)tin(IV)
99.9% trace metals basis
Reagent
Code: #58507
CAS Number
1066-77-9
blur_circular Chemical Specifications
scatter_plot
Molecular Information
Weight
295.01 g/mol
Formula
C₈H₂₄N₄Sn
badge
Registry Numbers
MDL Number
MFCD00014860
thermostat
Physical Properties
Boiling Point
53-55 °C at 1.013 hPa
inventory_2
Storage & Handling
Density
1.169 g/cm3
Storage
room temperature, dry, inert gas
description Product Description
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create thin films of tin-based materials, such as tin nitride or tin oxide, which are essential in semiconductor manufacturing and electronic devices. It is also employed in the synthesis of organotin compounds, which find applications in catalysts, stabilizers for PVC, and biocides. The compound’s high reactivity and volatility make it suitable for precise deposition in nanotechnology and advanced material research. Additionally, it plays a role in the development of transparent conductive coatings used in touchscreens and solar panels.
shopping_cart Available Sizes & Pricing
Cart
No products
Subtotal:
0.00
Total
0.00
THB