Cyclopentasilane is primarily used in the semiconductor industry for the production of thin-film silicon layers. It serves as a precursor for creating high-purity silicon films through chemical vapor deposition (CVD) or plasma-enhanced chemical vapor deposition (PECVD) processes. These films are essential in the fabrication of solar cells, where they enhance efficiency and performance. Additionally, it is utilized in the development of advanced electronic devices, including transistors and sensors, due to its ability to form uniform and defect-free silicon coatings. Its application also extends to the field of nanotechnology, where it aids in the synthesis of silicon-based nanostructures for innovative materials and devices.