Bis(t-butylimido)bis(dimethylamino)tungsten(VI)
99%(99.99%-W)
Reagent
Code: #54647
CAS Number
406462-43-9
blur_circular Chemical Specifications
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Molecular Information
Weight
414.24 g/mol
Formula
C₁₂H₃₀N₄W
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Registry Numbers
MDL Number
MFCD07369712
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Physical Properties
Boiling Point
81℃0.02 mm Hg(lit.)
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Storage & Handling
Density
1.305 g/mL at 25℃(lit.)
Storage
2-8℃
description Product Description
Used in chemical vapor deposition (CVD) processes to produce thin films of tungsten or tungsten compounds, essential in semiconductor manufacturing. Acts as a precursor for creating high-purity tungsten layers in microelectronics and integrated circuits. Also employed in the synthesis of specialized materials for advanced coatings and catalysts. Its stability and reactivity make it suitable for precise deposition in nanotechnology applications.
format_list_bulleted Product Specification
| Test Parameter | Specification |
|---|---|
| Appearance | Faint yellow to very dark yellow and faint orange to very dark orange liquid |
| Purity | 98.5-100 |
| Infrared Spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
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