Bis(t-butylimido)bis(dimethylamino)tungsten(VI)

99%(99.99%-W)

Reagent Code: #54647
fingerprint
CAS Number 406462-43-9

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 414.24 g/mol
Formula C₁₂H₃₀N₄W
badge Registry Numbers
MDL Number MFCD07369712
thermostat Physical Properties
Boiling Point 81℃0.02 mm Hg(lit.)
inventory_2 Storage & Handling
Density 1.305 g/mL at 25℃(lit.)
Storage 2-8℃

description Product Description

Used in chemical vapor deposition (CVD) processes to produce thin films of tungsten or tungsten compounds, essential in semiconductor manufacturing. Acts as a precursor for creating high-purity tungsten layers in microelectronics and integrated circuits. Also employed in the synthesis of specialized materials for advanced coatings and catalysts. Its stability and reactivity make it suitable for precise deposition in nanotechnology applications.

format_list_bulleted Product Specification

Test Parameter Specification
Appearance Faint yellow to very dark yellow and faint orange to very dark orange liquid
Purity 98.5-100
Infrared Spectrum Conforms to Structure
NMR Conforms to Structure

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 1g
10-20 days ฿15,750.00

Cart

No products

Subtotal: 0.00
Total 0.00 THB