Used in semiconductor manufacturing as a high-k dielectric material in advanced transistor gate stacks, enabling improved performance and reduced leakage current in microchips. Also applied in optical coatings for its high refractive index and durability under extreme conditions. Employed in research for thin-film deposition techniques like atomic layer deposition (ALD) and chemical vapor deposition (CVD). Shows potential in catalysis and as a dopant in specialty glasses for high-temperature applications.