Used as a precursor in chemical vapor deposition (CVD) processes for depositing magnesium-containing thin films, particularly in semiconductor and optoelectronic device fabrication. Its volatility and thermal stability make it suitable for depositing high-purity magnesium-based materials at relatively low temperatures. Also employed in research for synthesizing magnesium-doped materials and in organometallic chemistry as a reagent for forming magnesium-carbon bonds in catalytic reactions.