Used primarily in the production of high-purity silicon and silicon-based materials for semiconductor manufacturing. Acts as a precursor in chemical vapor deposition (CVD) processes to create silicon dioxide or silicon nitride thin films, which are essential in fabricating electronic devices and integrated circuits. Also employed in the synthesis of other silicon-containing compounds and specialty glasses. Its reactivity makes it useful in research and development of new materials in optoelectronics and photovoltaics.