Used as a specialty reagent in organic synthesis and semiconductor processing, particularly in chemical vapor deposition (CVD) processes for silicon-based thin films. Its high volatility and silicon content make it effective for depositing silicon carbide or silicon-rich silicon nitride layers at relatively low temperatures. Also serves as a methylating agent in research laboratories, transferring methyl groups to various substrates. Due to its reactivity with oxygen and moisture, it is handled under inert conditions, mainly in sealed systems for precise material fabrication.