Used primarily as a surface modifying agent to render materials hydrophobic. It forms a self-assembled monolayer on glass, silicon, and metal oxide surfaces, making them water-repellent. Commonly applied in microelectronics and MEMS devices to prevent stiction and moisture adhesion. Also used in chromatography to functionalize silica surfaces for reversed-phase separation. Provides a stable, durable coating that resists degradation under moderate conditions.