Used as a surface modifier in semiconductor manufacturing and microfabrication processes. It enables selective passivation of silicon-based materials by forming a hydrophobic monolayer on oxide surfaces. This property is leveraged in photolithography to improve pattern fidelity and reduce defects. Also applied in the preparation of functionalized substrates for biosensors and lab-on-a-chip devices due to its ability to tailor surface energy and promote specific molecular interactions. Its amine functionality allows further conjugation with biomolecules or polymers, making it useful in advanced coating technologies and nanotechnology applications.