Used as a surface modifying agent in semiconductor manufacturing, particularly for improving adhesion between silicon-based materials and metal layers. It acts as a silylating agent in the synthesis of organosilicon compounds, useful in creating precursors for silicon nitride or silicon carbide coatings via chemical vapor deposition (CVD). Also employed in the production of specialty silanes for coupling agents in advanced composite materials. Its amine functionality allows for catalytic roles in certain polymerization processes and as a ligand in metal-organic frameworks or transition metal catalysts.