Tungsten silicide is widely used in the semiconductor industry as a conductive material for integrated circuits, particularly in the fabrication of gate electrodes and interconnects. Its high thermal stability and low electrical resistance make it suitable for high-temperature applications, ensuring reliable performance in microelectronics. Additionally, it serves as a diffusion barrier in metallization processes, preventing unwanted interactions between layers in semiconductor devices. In the field of thin-film technology, tungsten silicide is employed in the production of solar cells and flat-panel displays due to its excellent electrical conductivity and durability. Its resistance to oxidation and corrosion also makes it valuable in protective coatings for various industrial components.