Trimethylgermanium bromide is primarily used in the field of organometallic chemistry and material science. It serves as a precursor in the synthesis of germanium-containing compounds and materials. In semiconductor manufacturing, it is employed to deposit germanium thin films through chemical vapor deposition (CVD) processes, which are essential for advanced electronic devices. Additionally, it plays a role in the development of optoelectronic materials, where germanium-based components are used in infrared optics and photodetectors. Its application extends to research and development of novel organometallic catalysts, contributing to advancements in organic synthesis and industrial chemical processes.