Used as a surface modifier in semiconductor manufacturing, particularly for enhancing adhesion between germanium-based materials and photoresists. Its methacryloxy group enables covalent bonding with organic layers during photolithography, improving pattern fidelity. Also applied in the synthesis of hybrid organic-inorganic polymers for optoelectronic devices due to germanium’s favorable electronic properties. Shows potential in modifying sensor surfaces where germanium integration with silicon platforms is required, offering stability and reactivity control.