Used in advanced semiconductor manufacturing processes, particularly in photolithography for high-resolution patterning. Acts as a key component in photoresist formulations, enhancing sensitivity and resolution under extreme ultraviolet (EUV) light. Enables production of smaller transistor features in cutting-edge integrated circuits, supporting the development of next-generation microprocessors and memory chips. Also investigated for use in low-k dielectric materials to reduce capacitance and signal delay in multilayer interconnect structures.