Ruthenium(III)iodidehydrate

98%

Reagent Code: #231043
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CAS Number 208346-20-7

science Other reagents with same CAS 208346-20-7

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 499.799 g/mol
Formula H₂I₃ORu
badge Registry Numbers
MDL Number MFCD02683102
thermostat Physical Properties
Melting Point 590 °C(lit.)
inventory_2 Storage & Handling
Storage 2-8°C

description Product Description

Used as a precursor in catalytic reactions, particularly in the synthesis of fine chemicals and pharmaceuticals. Exhibits utility in homogeneous catalysis due to its ability to facilitate carbon-heteroatom bond formation. Also employed in research settings for the development of new ruthenium-based catalysts with improved activity and selectivity. Shows potential in electrochemical applications, including as a component in certain types of sensors and in materials science for thin film deposition.

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Size Availability Unit Price Quantity
inventory 1g
10-20 days ฿10,880.00
inventory 5g
10-20 days ฿40,890.00

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Ruthenium(III)iodidehydrate
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Used as a precursor in catalytic reactions, particularly in the synthesis of fine chemicals and pharmaceuticals. Exhibits utility in homogeneous catalysis due to its ability to facilitate carbon-heteroatom bond formation. Also employed in research settings for the development of new ruthenium-based catalysts with improved activity and selectivity. Shows potential in electrochemical applications, including as a component in certain types of sensors and in materials science for thin film deposition.

Used as a precursor in catalytic reactions, particularly in the synthesis of fine chemicals and pharmaceuticals. Exhibits utility in homogeneous catalysis due to its ability to facilitate carbon-heteroatom bond formation. Also employed in research settings for the development of new ruthenium-based catalysts with improved activity and selectivity. Shows potential in electrochemical applications, including as a component in certain types of sensors and in materials science for thin film deposition.

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