Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)praseodymium(III)

≥98%

Reagent Code: #92773
fingerprint
CAS Number 15492-48-5

science Other reagents with same CAS 15492-48-5

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 690.72 g/mol
Formula C₃₃H₅₇O₆Pr
badge Registry Numbers
MDL Number MFCD00000027
thermostat Physical Properties
Melting Point 219-221°C
inventory_2 Storage & Handling
Storage room temperature

description Product Description

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)praseodymium(III) is primarily used in the field of materials science, particularly in the synthesis of advanced materials. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create thin films of praseodymium-containing compounds. These films are essential in the development of optical coatings, which are used in various high-tech applications such as lasers, sensors, and electronic devices. Additionally, this compound is employed in the preparation of luminescent materials, where it contributes to the enhancement of light-emitting properties in phosphors and other optoelectronic components. Its role in catalysis is also noteworthy, as it can be used in specific organic transformations, leveraging the unique properties of praseodymium to facilitate chemical reactions.

format_list_bulleted Product Specification

Test Parameter Specification
Appearance White to light yellow to green powder to crystal
Purity 97.5-100
Melting Point 219.0-221.0
Infrared Spectrum Conforms to Structure

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 250mg
10-20 days ฿1,640.00

Cart

No products

Subtotal: 0.00
Total 0.00 THB
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)praseodymium(III)
No image available

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)praseodymium(III) is primarily used in the field of materials science, particularly in the synthesis of advanced materials. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create thin films of praseodymium-containing compounds. These films are essential in the development of optical coatings, which are used in various high-tech applications such as lasers, sensors, and electronic devices. Additionally,

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)praseodymium(III) is primarily used in the field of materials science, particularly in the synthesis of advanced materials. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create thin films of praseodymium-containing compounds. These films are essential in the development of optical coatings, which are used in various high-tech applications such as lasers, sensors, and electronic devices. Additionally, this compound is employed in the preparation of luminescent materials, where it contributes to the enhancement of light-emitting properties in phosphors and other optoelectronic components. Its role in catalysis is also noteworthy, as it can be used in specific organic transformations, leveraging the unique properties of praseodymium to facilitate chemical reactions.

Mechanism -
Appearance -
Longevity -
Strength -
Storage -
Shelf Life -
Allergen(s) -
Dosage (Range) -
Dosage (Per Day) -
Mix Method -
Heat Resistance -
Stable in pH range -
Solubility -
Product Types -
INCI -

Purchase History for

Loading purchase history...