AZ-1355 is widely used in the semiconductor industry as a photoresist material. It plays a critical role in photolithography processes, where it is applied as a thin film onto silicon wafers. When exposed to ultraviolet (UV) light through a photomask, the material undergoes a chemical change, allowing for the precise patterning of microelectronic components. Its high resolution and sensitivity make it suitable for manufacturing integrated circuits, microchips, and other electronic devices. Additionally, AZ-1355 is valued for its stability and compatibility with various etching and development processes, ensuring accurate and reliable results in microfabrication.