Poly(vinyl cinnamate) is widely used in the field of photolithography, particularly in the production of microelectronic devices. Its photosensitive properties make it an excellent material for creating precise patterns on semiconductor surfaces. When exposed to ultraviolet light, it undergoes a cross-linking reaction, which allows for the formation of high-resolution images on substrates. This characteristic is crucial in the fabrication of integrated circuits and other microcomponents. Additionally, it is employed in the development of optical storage media, where its ability to form stable, light-induced patterns enhances data storage capacity and retrieval efficiency. In research, it serves as a model compound for studying photochemical reactions and polymer behavior under light exposure.