This chemical is primarily used in the field of material science, particularly in the development of advanced polymers and coatings. Its unique structure allows it to form stable, cross-linked networks, making it valuable for creating durable and high-performance materials. It is often employed in the synthesis of self-assembled monolayers (SAMs) for surface modification, enhancing properties like corrosion resistance, adhesion, and biocompatibility. Additionally, it finds applications in the production of photoresists for microfabrication processes in the electronics industry. Its ability to undergo photopolymerization makes it suitable for creating precise patterns in nanotechnology and photolithography.