2-cyano-4'-[8-(1,4-dioxa-8-azaspiro[4.5]decyl)methyl]benzophenone
97%
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This chemical is primarily utilized in the field of organic synthesis and material science. It serves as a key intermediate in the production of advanced materials, particularly those involving photoresist applications in semiconductor manufacturing. Its unique structure allows it to act as a photosensitive component, enabling precise patterning during the lithography process. Additionally, it is employed in the development of specialized coatings and adhesives, where its chemical properties enhance durability and performance under varying environmental conditions. In pharmaceutical research, it is explored for its potential in synthesizing novel compounds with targeted biological activities. Its versatility makes it valuable in both industrial and academic research settings.
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