2,5-dimethyl-2'-[8-(1,4-dioxa-8-azaspiro[4.5]decyl)methyl]benzophenone
97%
science Other reagents with same CAS 898756-10-0
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This chemical is primarily used in the field of organic synthesis, particularly in the development of photoresist materials for semiconductor manufacturing. Its structure allows it to act as a photoactive compound, enabling the creation of precise patterns on silicon wafers during the photolithography process. Additionally, it finds application in the production of advanced polymers and coatings, where its unique properties contribute to enhanced durability and performance. Its role in these industries highlights its importance in modern technology and material science.
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