This chemical is primarily used in organic synthesis as a highly efficient reagent for introducing the phenyl group into various substrates. Its application is particularly significant in the field of photochemistry, where it serves as a photoacid generator (PAG) in photoresist formulations for advanced lithography processes in semiconductor manufacturing. The compound's ability to release strong acids upon exposure to light makes it invaluable in creating high-resolution patterns on silicon wafers, essential for producing microelectronic devices. Additionally, it is employed in the synthesis of complex organic molecules, where its reactivity facilitates the formation of carbon-carbon and carbon-heteroatom bonds, aiding in the development of pharmaceuticals and fine chemicals. Its stability and precise reactivity under controlled conditions make it a versatile tool in both industrial and research settings.