1,11-Dioxa[11]paracyclophane

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Reagent Code: #174535
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CAS Number 6571-51-3

science Other reagents with same CAS 6571-51-3

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 234.34 g/mol
Formula C₁₅H₂₂O₂
thermostat Physical Properties
Melting Point 53.0-57.0°C
inventory_2 Storage & Handling
Storage Room temperature

description Product Description

Used primarily in polymer chemistry and materials science, this compound serves as a building block for synthesizing functional polymers with unique thermal and optical properties. Its rigid, cage-like structure enhances the stability and rigidity of resulting polymers, making them suitable for high-performance engineering plastics and specialty films. It is also explored in the development of photoresists for microelectronics due to its favorable reactivity under UV light. Additionally, its oxygen-rich framework supports applications in host-guest chemistry and supramolecular systems, where it can influence molecular recognition and binding behavior.

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Size Availability Unit Price Quantity
inventory 50mg
10-20 days ฿1,810.00
inventory 250mg
10-20 days ฿5,780.00
inventory 1g
10-20 days ฿19,250.00

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1,11-Dioxa[11]paracyclophane
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Used primarily in polymer chemistry and materials science, this compound serves as a building block for synthesizing functional polymers with unique thermal and optical properties. Its rigid, cage-like structure enhances the stability and rigidity of resulting polymers, making them suitable for high-performance engineering plastics and specialty films. It is also explored in the development of photoresists for microelectronics due to its favorable reactivity under UV light. Additionally, its oxygen-rich

Used primarily in polymer chemistry and materials science, this compound serves as a building block for synthesizing functional polymers with unique thermal and optical properties. Its rigid, cage-like structure enhances the stability and rigidity of resulting polymers, making them suitable for high-performance engineering plastics and specialty films. It is also explored in the development of photoresists for microelectronics due to its favorable reactivity under UV light. Additionally, its oxygen-rich framework supports applications in host-guest chemistry and supramolecular systems, where it can influence molecular recognition and binding behavior.

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