BR351 precursor is primarily used in the development of advanced photoresist materials, which are essential in semiconductor manufacturing. Its application is critical in photolithography processes, where it helps create precise patterns on silicon wafers for integrated circuits and microchips. The precursor contributes to the formation of high-resolution images, enabling the production of smaller and more efficient electronic components. It is particularly valued for its ability to enhance the performance of photoresists in extreme ultraviolet (EUV) lithography, a cutting-edge technology used in the fabrication of next-generation semiconductor devices. This makes it a key component in the electronics industry, supporting the miniaturization and increased functionality of modern technology.